Ultra Clean Processing of Semiconductor Surfaces VIII
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Beschreibung
Selected, peer reviewed papers from the 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) held in Antwerp, Belgium, September 18-20, 2006
Volume is indexed by Thomson Reuters CPCI-S (WoS).
This collection of 86 peer-reviewed papers covers all aspects of the use of ultra-clean technology for large-scale integration on semiconductors, and cleaning and contamination-control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing.
Autor*in
Trans Tech Publications Ltd
Themen in »Ultra Clean Processing of Semiconductor Surfaces VIII«
Cavitation Cleaning Copper (Cu) Germanium HF Megasonic Megasonic Cleaning Metal Gate Particle Removal Photoresist Stripping Post-Etch Cleaning SC-1 Silicon Silicon-Germanium (SiGe) Single Wafer Cleaning