EMLC 2008
24th European Mask and Lithography Conference - Lectures held at the GMM Conference January 21-24, 2008 in Dresden, Germany
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Beschreibung
The three-day conference is dedicated to the science, technology, engineering and application of mask and lithography technologies and associated processes, and gives an overview of the present status in mask and lithography technologies and the future strategy where mask producers and users have the opportunity to become acquainted with new developments and results. This years sessions included: "Double Patterning”, “Simulation”, “Mask Business & Mask Data Prep”, “Mask Cleaning & Haze”, Inspection & Repair”, “Resist”, “Metrology”, “RET”, “EUV” and “NIL”. A small Poster Session was also included.
Autor*in
Uwe Behringer
Themen in »EMLC 2008«
Lithography Technology Mask Technology Metrology Photomask