EMC 2003
19th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components; Lectures held at the GMM-Conference January 13-15, 2003 in Sonthofen, Germany
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Beschreibung
Inhalt:
In diesem Tagungsband werden u.a. Themen aus folgenden Bereichen behandelt: Advanced Mask Technology, Mask Defect and Inspection, Photomask Pattering, Mask Metrology and Measurements, Optical Proimity Correction and Resolution Enhancement techniques, Next generation Mask (NGM), Next Generation Lithography (NGL), Mask Error Enhancement Factor, MEEF, Concept of Manufacturing Procedures, EMC, OPC., u.a.
Die GMM-Fachberichte können auch im Abonnement bezogen werden!
Autor*in
Themen in »EMC 2003«
Advanced Mask Technology Mask Defect and Inspection Photomask Patterning Mask Metrology and Measurements Resolution Enhancement Techniques Next Generation Mask (NGM) Next Generation Lithography (NGL) Mask Error Enhancement Factor, MEEF Concept of Manufacturing Procedures EMC