Film Deposition by Plasma Techniques
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Beschreibung
Plasma deposition techniques are of major importance because they can be used to produce high-quality thin films for applications in device technology. This introduction to the subject contains sufficient details of the foundations of plasma science to be useful to newcomers to the field and, at the same time, ample information about specific techniques and new results, so that established researchers will also find it of interest.
Autor*in
Mitsuharu Konuma
Themen in »Film Deposition by Plasma Techniques«
Cross section Plasma collision design elastic collision hydrogen material mechanisms molecule negative ions particles polymer science semiconductor technology