Ternary and Quaternary Si(H)F-O, Si(H)F-N, and SiF(-O)-N Compounds, Derivatives Substituted at O and N, and Fluorosilicate Salts of O- and N-Based Cations

Beschreibung

The volume covers some 750 Si-F and Si(H)-F species which have additional bonds to oxygen, nitrogen, or both; O- and N-organylsubstituted derivatives and fluorosilicates are included. With Si coordination numbers ranging from two to six, the volume presents a broad spectrum of chemical topics. They extend from theoretical calculations on the stabilities and properties of the unstable SiFHO structural isomers, via preparative and structural results for penta- and hexacoordinated SiF4 adducts, to the use of fluoroalkoxysilanes in the formation of silicon films at low temperature, and the various methods of manufacturing (NH4)2SiF6. The physical properties of the ions in this salt were also studied at length.

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U. Klingebiel

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