Ohtsu Progress in Nano-Electro Optics III

Progress in Nano-Electro Optics III

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Industrial Applications and Dynamics of the Nano-Optical System

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Beschreibung

This unique monograph series "Progress in Nano-Electro Optics" reviews the results of advanced studies of electro-optics on the nanometric scale. This third volume covers the most recent topics of theoretical and experimental interest including classical and quantum optics, organic and inorganic material science and technology, surface science, spectroscopy, atom manipulation, photonics, and electronics. Each chapter is written by one or more leading scientists from the relevant field. Thus, high-quality scientific and technical information is provided to scientists, engineers, and students engaged in nano-electro optics and nanophotonics research. The first two volumes addressed the "Basics and Theory of Near Field Optics" (2002) and "Novel Devices and Atom Manipulation" (2003).


Near-?eld optical recording is a promising way to realize a recording density 2 of over 1 Tb/in . In this chapter, we focused on the near-?eld optical head, which is a key device for near-?eld optical recording. First, we explained the technical issues regarding the near-?eld optical head and introduced some solutions to these issues. We focused on a highly e?cient near-?eld optical head that uses a wedge-shaped metallic plate, and described its optical pr- erties based on a simulation using a ?nite-di?erence time-domain method. The simulation results con?rmed that a strong optical near ?eld is generated at the apex of the metallic plate when a plasmon is excited in the metallic plate. When a TbFeCo recording medium was placed 10 nm from the ne- ?eld optical head, the size of the optical spot was 30 nm, which corresponds 2 to an areal recording density of approximately 1 Tb/in . The e?ciency was 20% if we assume that the incident beam was a Gaussian beam with a full width at half-maximum of 1µ m. Furthermore, we discussed an optical head using two metallic plates. We con?rmed through our simulation that a highly localized optical near ?eld was generated at the gap when the plasmon was excited in the metallic plates. The distribution was 5 nm by 5 nm when the two apices were separated by 5 nm.
An up-to-date status report representing the current State of the art in nano-optics Will be useful to all researchers working at the forefront of nearfield optics and nanoelectro-optics

Autor*in

Motoichi Ohtsu

Themen in »Progress in Nano-Electro Optics III«

Electro-optics Nanotechnology Near-field optics Photonics basics nanophotonics optics spectroscopy

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Details

ISBN: 9783540268451
Verlag: Springer Berlin
Erscheinung: 17.12.2005

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