Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
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Beschreibung
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
Introduces a highly promising patterning solution for next generation technology Provides a comprehensive overview of directed self-assembly lithography (DSAL) friendly physical design and DSAL-aware mask synthesis Written by leading developers of this technology
Autor*in
Seongbo Shim
Themen in »Physical Design and Mask Synthesis for Directed Self-Assembly Lithography«
VLSI CAD for DSA Physical Design for DSA DSA-Friendly VLSI Design DSA.Aware Placement DSA-Aware Routing DSA-Aware Mask Optimization DSA-Aware OPC DSA Verification Multi-Patterning with DSA Inverse DSA Nanolithography Computational Litography