FIB Nanostructures

Beschreibung

FIB Nanostructures reviews a range of methods, including milling, etching, deposition, and implantation, applied to manipulate structures at the nanoscale. Focused Ion Beam (FIB) is an important tool for manipulating the structure of materials at the nanoscale, and substantially extends the range of possible applications of nanofabrication. FIB techniques are widely used in the semiconductor industry and in materials research for deposition and ablation, including the fabrication of nanostructures such as nanowires, nanotubes, nanoneedles, graphene sheets, quantum dots, etc. The main objective of this book is to create a platform for knowledge sharing and dissemination of the latest advances in novel areas of FIB for nanostructures and related materials and devices, and to provide a comprehensive introduction to the field and directions for further research. Chapters written by leading scientists throughout the world create a fundamental bridge between focused ion beam and nanotechnology that is intended to stimulate readers' interest in developing new types of nanostructures for application to semiconductor technology. These applications are increasingly important for the future development of materials science, energy technology, and electronic devices. The book can be recommended for physics, electric engineering, and materials science departments as a reference on materials science and device design.

• Offers comprehensive coverage of novel nanostructures fabricated by focused ion beam
• Provides the keys to understanding the emerging area of FIB nanostructures
• Written by leading experts in each research area
• Describes a key enabling technology forming a bridge between materials science research and the development of energy-related and other electronicdevices

FIB Nanostructures reviews a range of methods, including milling, etching, deposition, and implantation, applied to manipulate structures at the nanoscale. Focused Ion Beam (FIB) is an important tool for manipulating the structure of materials at the nanoscale, and substantially extends the range of possible applications of nanofabrication. FIB techniques are widely used in the semiconductor industry and in materials research for deposition and ablation, including the fabrication of nanostructures such as nanowires, nanotubes, nanoneedles, graphene sheets, quantum dots, etc. The main objective of this book is to create a platform for knowledge sharing and dissemination of the latest advances in novel areas of FIB for nanostructures and related materials and devices, and to provide a comprehensive introduction to the field and directions for further research. Chapters written by leading scientists throughout the world create a fundamental bridge between focused ion beam and nanotechnology that is intended to stimulate readers' interest in developing new types of nanostructures for application to semiconductor technology. These applications are increasingly important for the future development of materials science, energy technology, and electronic devices. The book can be recommended for physics, electrical engineering, and materials science departments as a reference on materials science and device design.

Autor*in

Zhiming M. Wang

Themen in »FIB Nanostructures«

AFM Cantilever Calibration Agmicro-Nanostructures Deterministic Fabrication of Nanostructures FIB Epitaxial Ferroelectric Nanostructures FIB FIB Fabrication Semiconductor Nanostructures FIB Induced Deposition FIB Milling FIB-Fabricated AU Focused Ion Beam Gratings and Speckle Patterns FIB Ion Beam Ething Ion Beam Milling Mass-Separated FIB Nano-Needles FIB

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