Proceedings of the International Symposium on Materials Science Applications of Ion Beam Techniques incorporating the 1st German-Australian Workshop on Ion Beam Analysis, Seeheim, Germany, September 1996
The first particle accelerators were built in the early 1930’s. For a long time, these devices were used exclusively by nuclear physicists. In the 1960’s, extensive developments in measuring techniques occurred, mainly as a result of newly developed semiconductor devices. Further strong interest arose from the semiconductor industry, and ion implantation became widely accepted as being the ultimate tool for Si-based device fabrication.
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Amorphisation Ceramic Depth-Profiling Diffusion GaAs Heavy Ions High Energy Irradiation Ion Beam Ion Beam Analysis Ion Implantation Molecular Dynamic (MD) Radiation Damage RBS Rutherford Backscattering Rutherford Backscattering Spectrometry