Ngozi Enemuo Kingsley Ukoba Tien-Chien Jen Enemuo Atomic Layer Deposition in Membrane Modification for Water Treatment and Gas Separation

Atomic Layer Deposition in Membrane Modification for Water Treatment and Gas Separation

von Ngozi Enemuo Kingsley Ukoba Tien-Chien Jen

Concepts, Applications, and Challenges

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Beschreibung

Atomic Layer Deposition (ALD) is an emerging gas-phase deposition process that offers several advantages over conventional deposition methods. However, despite its benefits, reports on its application in membrane modification are minimal.

This book focuses on the use of ALD as a membrane modification approach for improved separation applications across various fields. It starts with an introduction to membrane science and ALD chemistry, followed by a detailed examination of the application of ALD in modifying polymeric, ceramic, and hybrid membranes. The text covers applications in reverse osmosis, nanofiltration, ultrafiltration, membrane distillation, and various gas separation technologies, including CO₂ capture, hydrogen purification, and hydrocarbon separations.

This book integrates fundamental concepts, recent research, and practical knowledge in the field of membrane technology and is a useful resource for industrialists, researchers, and advanced graduate students working or entering the field.

In addition, this book:   Provides an accessible overview of the basics of Atomic Layer Deposition (ALD) and membrane science Examines the potential of ALD to improve membrane separation performance for water treatment and gas separation uses Compares ALD with other surface modification techniques and evaluates environmental and economic factors

Atomic Layer Deposition (ALD) is an emerging gas-phase deposition process that offers several advantages over conventional deposition methods. However, despite its benefits, reports on its application in membrane modification are minimal.

This book focuses on the use of ALD as a membrane modification approach for improved separation applications across various fields. It starts with an introduction to membrane science and ALD chemistry, followed by a detailed examination of the application of ALD in modifying polymeric, ceramic, and hybrid membranes. The text covers applications in reverse osmosis, nanofiltration, ultrafiltration, membrane distillation, and various gas separation technologies, including CO₂ capture, hydrogen purification, and hydrocarbon separations.

This book integrates fundamental concepts, recent research, and practical knowledge in the field of membrane technology and is a useful resource for industrialists, researchers, and advanced graduate students working or entering the field.


Provides an accessible overview of the basics of Atomic Layer Deposition (ALD) and membrane science Examines the potential of ALD to improve membrane separation performance for water treatment and gas separation uses Compares ALD with other surface modification techniques and evaluates environmental and economic factors

Autor*in

Ngozi Enemuo

Themen in »Atomic Layer Deposition in Membrane Modification for Water Treatment and Gas Separation«

Atomic Layer Deposition (ALD) Atomic Layer Deposition techniques Thin-film coating Membrane modification Membrane technology Water treatment Gas separation Membrane permeability, selectivity, and stability Self-cleaning membranes Anti-fouling membrane

Stimmen zu »Atomic Layer Deposition in Membrane Modification for Water Treatment and Gas Separation«

Details

ISBN: 9783032342263
Verlag: Springer International Publishing
Erscheinung: 03.10.2026

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