Epitaxy of Semiconductors
Physics and Fabrication of Heterostructures
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Beschreibung
The extended and revised edition of this textbook provides essential information for a comprehensive upper-level graduate course on the crystalline growth of semiconductor heterostructures. Heteroepitaxy is the basis of today’s advanced electronic and optoelectronic devices, and it is considered one of the most important fields in materials research and nanotechnology. The book discusses the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and it describes the major growth techniques: metalorganic vapor-phase epitaxy, molecular-beam epitaxy, and liquid-phase epitaxy. It also examines in detail cubic and hexagonal semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures, and processes during nucleation and growth. Requiring only minimal knowledge of solid-state physics, it provides natural sciences, materials science and electrical engineering students and their lecturers elementary introductions to the theory and practice of epitaxial growth, supported by references and over 300 detailed illustrations.
Provides the essentials for a comprehensive graduate course on crystal growth of semiconductor heterostructures Covers thermodynamics and kinetics of layer growth and major growth techniques Contains many instructive illustrations and examples Supports learning with exercises after each chapter and solutions in the end of the book
Autor*in
Udo W. Pohl
Themen in »Epitaxy of Semiconductors«
Semiconductor Nanostructures Materials for Optoelectronics Semiconductor Heterostructures Thermodynamics of Layer Growth Molecular Beam Epitaxy Liquid Phase Epitaxy Materials Sciences