Lars Rebohle Slawomir Prucnal Denise Reichel Rebohle Flash Lamp Annealing

Flash Lamp Annealing

von Lars Rebohle Slawomir Prucnal Denise Reichel

From Basics to Applications

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Beschreibung

This book provides a comprehensive survey of the technology of flash lamp annealing (FLA) for thermal processing of semiconductors. It gives a detailed introduction to the FLA technology and its physical background. Advantages, drawbacks and process issues are addressed in detail and allow the reader to properly plan and perform their own thermal processing. Moreover, this books gives a broad overview of the applications of flash lamp annealing, including a comprehensive literature survey. Several case studies of simulated temperature profiles in real material systems give the reader the necessary insight into the underlying physics and simulations. This book is a valuable reference work for both novice and advanced users.


Presents a detailed introduction to the flash lamp annealing technology and its physical background.

Addresses advantages, drawbacks and process issues in detail and allows the reader to properly plan and perform their own thermal processing

Provides a broad overview of the applications of flash lamp annealing, including a comprehensive  literature survey

Features several unique case studies of simulated temperature profiles in real material systems to improve the reader’s understanding


Presents a detailed introduction to the flash lamp annealing technology and its physical background. Addresses advantages, drawbacks and process issues in detail and allows the reader to properly plan and perform their own thermal processing Provides a broad overview of the applications of flash lamp annealing, including a comprehensive literature survey Features several unique case studies of simulated temperature profiles in real material systems improve the reader’s understanding of the underlying physics and what to consider for his own simulations

Autor*in

Lars Rebohle

Themen in »Flash Lamp Annealing«

Millisecond annealing FLA assisted deposition Semiconductor nanostructures Transparent conducting oxides High-k materials High-k dielectrics

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Details

ISBN: 9783030232993
Verlag: Springer International Publishing
Erscheinung: 27.07.2019

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