This book provides a comprehensive survey of the technology of flash lamp annealing (FLA) for thermal processing of semiconductors. It gives a detailed introduction to the FLA technology and its physical background. Advantages, drawbacks and process issues are addressed in detail and allow the reader to properly plan and perform their own thermal processing. Moreover, this books gives a broad overview of the applications of flash lamp annealing, including a comprehensive literature survey. Several case studies of simulated temperature profiles in real material systems give the reader the necessary insight into the underlying physics and simulations. This book is a valuable reference work for both novice and advanced users.
Presents a detailed introduction to the flash lamp annealing technology and its physical background.
Addresses advantages, drawbacks and process issues in detail and allows the reader to properly plan and perform their own thermal processing
Features several unique case studies of simulated temperature profiles in real material systems to improve the reader’s understanding
Lars Rebohle
Millisecond annealing FLA assisted deposition Semiconductor nanostructures Transparent conducting oxides High-k materials High-k dielectrics