Ramanathan Thin Film Metal-Oxides

Thin Film Metal-Oxides

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Fundamentals and Applications in Electronics and Energy

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Beschreibung

Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers.

Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.

 


Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.  
Analyzes thin film deposition techniques for oxides with a special emphasis on high quality oxide fabrication Explores the functionalities and effects of nanostructures in thin film properties Discusses materials issues in oxide thin films and the relationship to applications Describes low temperature oxide thin film synthesis

Autor*in

Shriram Ramanathan

Themen in »Thin Film Metal-Oxides«

advanced transistor devices atomic layer deposition catalysis chemistry defect chemistry electron microscopy electronics film gate dielectrics low temperature synthesis metal-oxides renewable energy semiconductor stoichiometry thin films

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Details

ISBN: 9781441906649
Verlag: Springer US
Erscheinung: 03.12.2009

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