Atomic Layer Deposition
Principles, Characteristics, and Nanotechnology Applications
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Beschreibung
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Autor*in
Tommi Kääriäinen
Themen in »Atomic Layer Deposition«
Atomlagenabscheidung Dünne Schicht Dünne Schichten, Oberflächen u. Grenzflächen Industrial Engineering Industrial Engineering / Manufacturing Industrielle Verfahrenstechnik Materials Science Materialwissenschaften Nanotechnologie Nanotechnology Nanotechnology Special Topics Produktion i. d. Industriellen Verfahrenstechnik Spezialthemen Nanotechnologie Thin Films, Surfaces & Interfaces