Rapid Thermal Processing and beyond: Applications in Semiconductor Processing
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Beschreibung
Special topic volume with invited papers only
Heat-treatment and thermal annealing are very common processing steps which have been employed during semiconductor manufacturing right from the beginning of integrated circuit technology. In order to minimize undesired diffusion, and other thermal budget-dependent effects, the trend has been to reduce the annealing time sharply by switching from standard furnace batch-processing (involving several hours or even days), to rapid thermal processing involving soaking times of just a few seconds. This transition from thermal equilibrium, to highly non-equilibrium, processing was very challenging and is still a field ripe for further development.
Autor*in
Trans Tech Publications Ltd
Themen in »Rapid Thermal Processing and beyond: Applications in Semiconductor Processing«
Activation Boron Diffusion FinFET Flash Annealing Flash Lamp Annealing Gate Dielectric Ion Implantation Laser Annealing Millisecond Annealing Pattern Effects Plasma Nitridation Rapid Thermal Annealing (RTA) Rapid Thermal Processing RTP