Plasma Processing of Semiconductors
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Beschreibung
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications.
Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Autor*in
P.F. Williams
Themen in »Plasma Processing of Semiconductors«
Plasma collision dusty plasma integrated circuit optics photoelektrochemische Zelle plasma etching plasma processing