Ion Implantation Technology
17th International Conference on Ion Implantation Technology
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Beschreibung
The conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment issues, maintenance and design. The primary audience is process engineers in the microelectronics industry. Additional contributions come from academia and other industry segments (automotive, aerospace, and medical device manufacturing).
Autor*in
Edmund G. Seebauer
Themen in »Ion Implantation Technology«
CMOS MOSFET fabrication Process Controll in semiconductor processing Si and SiGe Processing Yield in semiconductor processing cluster beams dopant diffusion doping processes and annealing ion implantation plasma immersion ultra-shallow junctions